Organizers:

Representative

Masaharu SHIRATANI	Kyushu University

Co-Organizers

Shojiro KOMATSU	National Institute for Materials Science
Fumiyoshi TOCHIKUBO	Tokyo Metropolitan University
Masafumi ITO	Meijo University
Eun Ha CHOI	Kwangwoon University
Boonchoat PAOSAWATYANYOUNG	Chulalongkon University

Correspondence

Akihisa OGINO	Shizuoka University	taogino@ipc.shizuoka.ac.jp

Scope:

Plasma-based fabrication of nanomaterials and nanostructures is widely employed for top-downprocesses such as ULSI processing as well as bottom-up processes such as carbon nanotube production. In this session, the attendees will discuss frontier science of interactions between plasmas and nano-interfaces by focusing on novel features such as fluctuations of interactions due to the nanometer scale. Plasma processing based on the science realizes highly precise top-down processes by suppressing fluctuations and well controlled self-organized bottom-up processes bycontrolling fluctuations. Fluctuation-Induced Processing of Materials is expected to bring about an explosive development of fabrication technologies of nanomaterials and nanostructures.

Topics:

• Generation of interactions between plasmas and nano-interfaces
• Diagnostics of interactions between plasmas and nano-interfaces
• Applications of interactions between plasmas and nano-interfaces

Keynote Speakers:

JeonGeon HAN	Sungkyunkwan University

Lecture title: Plasma Process Design for Functional Film Synthesis on Plastic Substrate

Kazuo TERASHIMA	Tokyo University

Lecture title: Plasma in supercritical fluid and its application to materials processimg - density-fluctuation-induced plasma processing of nanomaterials -

Invited Speakers:

Toshiaki KATO	Tohoku University

Lecture title: Advanced plasma CVD for structural-controlled growth of single-walled carbon nanotube and graphene

Hiroki KONDO	Nagoya University

Lecture title: Advanced plasma science and technologies for nanostructure control of carbon nanomaterials

Tomohiro NOZAKI	Tokyo Institute of Technology

Lecture title: Silicon Nanocrystal Thin Films: Application to Quantum-dot Photovoltaics

Koichi ONO	Kyoto University

Lecture title: Surface Roughening and Rippling during Plasma Etching

Satoshi HAMAGUCHI	Osaka University

Lecture title: Ion-bombardment-induced diffusion and drift of impurity atoms in solids

Uros CVELBAR	Jozef Stefan Institure

Lecture title: Making nanowires ultra-nanoporous

Partha Sarathi MUKHERJEE	IMMT

Lecture title: ADVANCED THERMAL PLASMA PROCESSING FOR MAKING VALUE ADDED PRODUCTS

Vladimir SVRCEK	AIST

Lecture title: Interactions between plasmas and silicon nanocrystals interfaces

Osamu SAKAI	Kyoto Univ.

Lecture title: Roles of nonlinear transition phenomena in plasma processes