Symposia & Program

Organizers:

Scope:

Ion beam technology has, for half a century, made a significant contribution to the progress of science and industry such as electronics, photonics, machine industry, etc., through the synthesis of advanced materials, the modification of surface properties of materials, the modification of surface morphology and texture. Recently, it has been required to develop the energy saving system, processes and devices, high efficient energy utilization ones and the low environmental load ones, from the view point of the global environmental problems, and therefore to develop advanced materials which underlie these systems, processes and devices. It is expected that ion beam technology plays an important role for the production of advanced materials. This session will address the challenges associated with innovative material technologies that utilize ion beam. Specifically, papers that focus on the ion-beam synthesis of advanced materials as well as new utilization techniques of ion beam are encouraged. We are looking forward to having broad, interdisciplinary discussions that will lead to breakthrough in materials science.

Topics:

1.Fundamentals of ion-solid interaction
2.Nanostructure synthesis and modification
3. Modification/control of materials' properties
4.Cluster ions, swift heavy ions, highly charged ions, etc.
5.Plasma immersion, sputtering, plasma-induced modification
6.Modification of polymers and biomaterials

List of Invited Speakers and tentative titles (ABC-order):

• 1.
  Prof. Feng Chen (Shandong University, China)
  Embedded Metallic Nanoparticles in Dielectric Crystals by Ion Implantation for Generation of Laser Pulses
• 2.
  Prof. Daryush Ila (Fayetteville State University, USA)
  Fabrication of nano- to micro-optical-structures in silica
• 3.
  Prof. Manabu Ishimaru (Kyushu Institute of Technology, Japan)
  Transmission electron microscopy study on radiation tolerance of nanostructured and amorphous materials
• 4.
  Prof. Xin Ou (Shanghai Institute of Microsystem and Information Technology, China)
  Universal“Ion-cut” for nanopatterning, modification and heterointegration of semiconductors
• 5.
  Dr. Satoshi Yoshioka (Kyushu University, Japan)
  Atomistic structure investigation on ion beam induced defects by X-ray absorption spectroscopy / first-principles spectrum calculation
• 6.
  Prof. Tsuyoshi Yoshitake (Kyushu University, Japan)
  Applications of ultrananocrystalline diamond films prepared by coaxial arc plasma deposition to hard coating