The 26th Annual Meeting of MRS-J Program List: Oral
Innovative Material Technologies Utilizing Ion Beams |
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| Entry No | Keynote/ Invited |
Presentation | Date | Time to start |
Time to finish |
Award | Presenter Name | Affiliation | Paper Title |
Dec. 20  10:00 - 11:40 産業貿易センタービル 302室 / INDUSTRY & TRADE CENTER , Room 302 |
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Chair : 小林 知洋（理化学研究所） Tomohiro KOBAYASHI (RIKEN) |
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| Opening | Dec. 20 | 10:00 | 10:05 | H. Amekura (NIMS) | |||||
| 2343 | Invited | D3-I20-001 | Dec. 20 | 10:05 | 10:35 | Takeshi OHSHIMA | National Institutes for Quantum and Radiological Science and Technology | Creation of Single Photon Sources in Wide Bandgap Semiconductors by Ion Irradiation | |
| 2638 | Invited | D3-I20-002 | Dec. 20 | 10:35 | 11:05 | Zengfeng DI | State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning Road, Shanghai 200050 | Synthesis of layer-tunable and bandgap-tunable graphene on Ni/Cu Bilayer substrate by ion implantation | |
| 2699 | D3-O20-003 | Dec. 20 | 11:05 | 11:20 | Akihiro IWASE | Department of Materials Science, Osaka Prefecture University | Effect of 50keV Ar ion irradiation and thermal treatment on magnetic properties of FeRh thin films | ||
| 2817 | D3-O20-004 | Dec. 20 | 11:20 | 11:35 | *M | Kenta KAKITANI | School of Engineering, The University of Tokyo | The Interface between Pt Nanoparticles and the Ar+ Irradiated Glassy Carbon Substrate | |
| Discussion with invited speakers and organizers | Dec. 20 | 11:35 | 13:10 | ||||||
Dec. 20 14:00 - 17:40 産業貿易センタービル 302室 / INDUSTRY & TRADE CENTER , Room 302 |
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Chair : 岸本 直樹（物材機構） Naoki KISHIMOTO (NIMS) |
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| 2339 | Keynote | D3-K20-005 | Dec. 20 | 14:00 | 14:40 | Hiroshi TSUJI | Graduate School of Engineering, Kyoto Uniersity | Negative-Ion Implantation and Adhesion Patterning of Adult-Stem Cells on Polymer Surfaces | |
Chair : |
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| 2351 | Invited | D3-I20-006 | Dec. 20 | 14:40 | 15:10 | Anders HALLEN | KTH Royal Institute of Technology | Recent advances in ion beam processing of SiC power electronic devices | |
| 2705 | Invited | D3-I20-007 | Dec. 20 | 15:10 | 15:40 | Kazumasa NARUMI | National Institutes for Quantum and Radiological Science and Technology | Research and Development in Cluster-Ion Beams at QST/Takasaki | |
| 2549 | D3-O20-008 | Dec. 20 | 15:40 | 15:55 | Hiroshi AMEKURA | National Institute for Materials Science (NIMS) | Shape elongation of embedded metal nanoparticles induced by C60 cluster ion irradiation | ||
| 2120 | D3-O20-009 | Dec. 20 | 15:55 | 16:10 | *M | Kengo FUKUDA | Graduate School of Osaka Prefecture University | Magnetic and optical properties of silica glass implanted with energetic metal ions | |
| Coffee Break | Dec. 20 | 16:10 | 16:40 | ||||||
Chair : 伊藤 久義（量子科学技術研究開発機構） Hisayoshi ITOH (QST) |
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| 2014 | Invited | D3-I20-010 | Dec. 20 | 16:40 | 17:10 | Shengqiang ZHOU | Helmholtz-Zentrum Dresden-Rossendorf | Ion implantation + sub-second annealing: a route towards hyperdoped semiconductors | |
| 2291 | D3-O20-011 | Dec. 20 | 17:10 | 17:25 | *M | Masaaki OCHI | Osaka Prefecture University | Change in lattice structure and hardness of NiTi intermetallic compound induced by energetic ion irradiation and thermal annealing | |
| 2788 | D3-O20-012 | Dec. 20 | 17:25 | 17:40 | *M | Yohei UENO | Graduate school of Engineering, Osaka Prefecture University | Hydrogen trapping behavior in B2 ordered Fe-Al alloys after H+ irraditation | |
Dec. 21 11:40 - 16:20 産業貿易センタービル 302室 / INDUSTRY & TRADE CENTER , Room 302 |
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| Discussion with invited speakers and organizers | Dec. 21 | 11:40 | 13:10 | ||||||
| Break | Dec. 21 | 13:10 | 14:00 | ||||||
Chair : Stefan FLEGE (TU Darmstadt, Germany) |
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| 2603 | Invited | D3-I21-001 | Dec. 21 | 14:00 | 14:30 | Yasuo SHIMIZU | Institute for Materials Research, Tohoku University | Atom Probe Tomography of Semiconductor and Oxide Materials | |
| 2772 | D3-O21-002 | Dec. 21 | 14:30 | 14:45 | *M | Chikasa NISHIMURA | Graduate school of Engineering, Kyoto University | A Whole and Clear image processing of Ar-Field Ion Microscope image | |
| 2017 | Invited | D3-I21-003 | Dec. 21 | 14:45 | 15:15 | Kazuhiro KANDA | Laboratory of Advanced Science and Technology for Industry, University of Hyogo | Evaluation of amourphous carbon film by X-ray absorption spectroscopy | |
| 2793 | D3-O21-004 | Dec. 21 | 15:15 | 15:30 | Hiroyuki NISHIKAWA | Dept. of Electrical Engineeirng, Shibaura Institute of Technology/SIT Research Laboratories, Shibaura Institute of Technology | Proton Beam Writing on PolyVinilydene DiFluoride Films for Sensor Applications | ||
Chair : 西川 宏之（芝浦工業大学） Hiroyuki NISHIKAWA (Shibaura Inst. of Tech.) |
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| 2359 | Invited | D3-I21-005 | Dec. 21 | 15:30 | 16:00 | Stefan FLEGE | Technische Universitaet Darmstadt | Use of nanoparticles as a metal source in plasma processes | |
| 2003 | D3-O21-006 | Dec. 21 | 16:00 | 16:15 | Setsuo NAKAO | AIST-Chubu | Preparation of Ti-B-N films by plasma based ion implantation with sputtering methods | ||
| Closing | Dec. 21 | 16:15 | 16:20 | S. NAKAO (AIST-Chubu) | |||||